In-situ optical emission spectroscopic examination of chrome etch for photomasks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4754, Issue , 2002, Pages 312-322

  Anderson, Rex ^a   Sandlin, Nicole ^a   Buie, Melisa J ^a   Su, Clyde ^b   Agarwal, Ashish ^a   Brooks, Cindy ^a   Huang, Yi Chiau ^a   Stoehr, Brigitte ^a  

^a Etec Systems Inc   (United States)

^b Photronics Asia Pacific ^*  (Taiwan)

Author keywords

Chrome etch; Endpoint detection; OES; Optical emission spectroscopy; Plasma diagnostics; Principal component analysis

Indexed keywords

LIGHT EMISSION; MASKS; PLASMA DIAGNOSTICS; PRINCIPAL COMPONENT ANALYSIS; SPECTROSCOPIC ANALYSIS;

OPTICAL EMISSION SPECTROSCOPY (OES);

DRY ETCHING;

EID: 0036460669     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.476993     Document Type: Conference Paper

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