Application of a multiple wavelength absorption endpoint system in photomask dry etcher

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4754, Issue , 2002, Pages 341-349

  Min, Dong‐Soo ^a   Jang, Pil‐Jin ^a   Kwon, Hyuk‐Joo ^a   Choi, Boo‐Yeon ^a   Jeong, Soo‐Hong ^a  

^a PKL   (South Korea)

Author keywords

Dry etcher; Endpoint detection; Multiple wavelength absorption; Optical emission

Indexed keywords

LIGHT EMISSION; MASKS; MICROELECTRONICS; OPTICAL CABLES; SIGNAL DETECTION;

ENDPOINT DETECTION;

DRY ETCHING;

EID: 0036458690     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.476953     Document Type: Article

References (3)

1. th, 1994, pp.1-10.
2. Thomas Faure, Cuc Huynh, Michael Lercel, Adam Smith, and Thomas Wagner "Utilization of Optical Emission Endpoint in Photomask Dry Etch Processing" 21th Annual BACUS Symposium Photomask Technology 2001, Vol.4562-07, 2001.
3. Yong Sim Yoo, Chul Woong Park and Jae Won Hahn, "Detection of the Endpoint in the SiO2/Si Etching Process by Using a Two-Color Emission Spectroscopic Mothod" the Korean Physical Society Volume 10, Number 1, 1997. Jan. pp.7-11.