Electrical conductivity of sidewall-deposited fluorocarbon polymer in SiO2 etching processes

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 6, 2002, Pages 2346-2350

  Shimmura, T ^a   Soda, S ^a   Samukawa, S ^a   Koyanagi, M ^a   Hane, K ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; COMPOSITION; CROSSLINKING; ELECTRIC CONDUCTIVITY OF SOLIDS; ETCHING; FOURIER TRANSFORM INFRARED SPECTROSCOPY; SILICA; X RAY PHOTOELECTRON SPECTROSCOPY;

CONTACT HOLE ETCHING; FLUOROCARBON POLYMER; ULTRALARGE SCALE INTEGRATION DEVICES;

FLUORINE CONTAINING POLYMERS;

EID: 0036883099     PISSN: 0734211X     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1520551     Document Type: Article

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