Near 0.3 k1 Full Pitch Range Contact Hole Patterning Using Chromeless Phase Lithography (CPL)

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5256, Issue 1, 2003, Pages 297-308

  Van Den Broeke, Douglas ^a   Socha, Robert ^a   Hsu, Stephen ^a   Chen, J Fung ^a   Laidig, Tom ^a   Corcoran, Noel ^a   Hollerbach, Uwe ^a   Wampler, Kurt E ^a   Shi, Xuelong ^a  

^a ASML US Inc   (United States)

Author keywords

Chromeless Phase Lithography; Contact hole imaging; CPL; Interference mapping; Model OPC; Off axis illumination; PSM; QUASAR; Resolution enhancement techniques

Indexed keywords

ALGORITHMS; ELECTROMAGNETIC WAVE ATTENUATION; IMAGING SYSTEMS; LIGHT INTERFERENCE; MASKS; OPTICAL INSTRUMENT LENSES; PHASE SHIFT; SILICON WAFERS;

CHROMELESS PHASE LITHOGRAPHY (CPL); CONTACT HOLE IMAGING; CPL; INTERFERENCE MAPPING; OFF-AXIS ILLUMINATION; OPC; QUASAR; RESOLUTION ENHANCEMENT TECHNIQUES;

PHOTOLITHOGRAPHY;

EID: 1842475075     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.518308     Document Type: Conference Paper

References (10)

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