Mighty high-T lithography for 65nm generation contacts

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5040 II, Issue , 2003, Pages 1210-1219

  Conley, Will ^a   Montgomery, Patrick ^b   Lucas, Kevin ^a   Litt, Lloyd C ^a   Maltabes, John G ^a   Dieu, Laurent ^c   Hughes, Greg ^c   Mellenthin, David ^c   Socha, Robert ^d   Fanucchi, Eric ^a   Verhappen, Arjan ^e   Wampler, Kurt ^d   Yu, Linda ^d   Schaefer, Erika ^d   Cassel, Shawn ^d   Kuijten, Jan Pieter ^d   Pijnenburg, Wil ^e   Wiaux, Vincent ^b   Vandenberghe, Geert ^b  

^a MOTOROLA INC   (United States)

^b IMEC   (Belgium)

^c DPI Reticle Technology Center LLC   (United States)

^d ASML US Inc   (United States)

^e ASML   (Netherlands)

Author keywords

Attenuated; High transmission; Imaging; Inspection; Lithography; Phase shift

Indexed keywords

COMPUTER SIMULATION; ELECTRIC CONTACTS; ETCHING; IMAGING TECHNIQUES; MASKS; OPTICAL MULTILAYERS; PHOTORESISTS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON NITRIDE; TITANIUM NITRIDE;

CONTACT PATTERNING; HIGH TRANSMISSION LITHOGRAPHY; MASK MANUFACTURING; OPTICAL PROXIMITY CORRECTION; PHASE SHIFTING MASK; TRENCH LITHOGRAPHY;

LITHOGRAPHY;

EID: 0141721818     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485499     Document Type: Conference Paper

References (4)

1. ITRS 2001 roadmap
2. Personal Communication, Bruce Smith, 2001.
3. J.G. Maltabes, et al., "Tri-tone you'll like it, for 65nm generation contacts", Proceedings of ARCH Interface 2002.
4. V. Wiaux, et. al., "ArF Solutions for Low-k1 Back-end Imaging", SPIE Optical Microlithography XVI, 2003 [5040-26]