Application of alternating phase-shifting masks to sub-quarter micron contact holes

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2726, Issue , 1996, Pages 516-523

  Lim, Sung Chul ^a   Kye, Jong Wook ^a   Woo, Sang Gyun ^a   Kim, Sung Gi ^a   Kang, Ho Young ^a   Hah, Woo Sung ^a   Koh, Young Bum ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

Alternating PSM; Contact holes; Hybrid PSM; Optical lithography; Phase Shifting Mask (PSM)

Indexed keywords

COHERENT LIGHT; COMPUTER SIMULATION; FOCUSING; PHASE SHIFT; PHOTOLITHOGRAPHY;

CONTACT HOLES; PHASE-SHIFTING MASKS (PSM);

MASKS;

EID: 0030313042     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.240950     Document Type: Conference Paper

References (6)

1. Improving resolution in photolithography with a phase-shifting mask
2. The attenuated phase-shifting mask
3. 0.3-micron optical lithography using a phase-shifting mask
4. New phase shifting mask with self-aligned phase shifters for a quarter micron photolithography
5. Chromless phase-shifted masks: A new approach to phase-shifting masks
6. Design methodology for dark-field phase-shifted masks