Ring test aberration determination and device lithography correlation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4346, Issue 1, 2001, Pages 36-44

  Garza, César M ^a   Conley, Will ^a   Roman, Bernie ^a   Schippers, Mike ^a   Foster, Jim ^b   Baselmans, Jan ^b   Cummings, Kevin ^b   Flagello, Donis ^b  

^a MOTOROLA INC   (United States)

^b ASML US Inc   (United States)

Author keywords

Aberration; Lens; Optical microlithography; Scanner; Stepper; Zernike coefficients

Indexed keywords

COMPUTER SIMULATION; INTERFEROMETRY; MATHEMATICAL MODELS; PHOTOLITHOGRAPHY; POLYNOMIALS;

OPTICAL MICROLITHOGRAPHY;

ABERRATIONS;

EID: 0035758335     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.435749     Document Type: Article

References (5)

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2. E. Hect, Optics 3th Edition. P:259, Addison Wesley, 1998
3. V.N. Mahajan, "Zernike Circle Polynomials and Optical Aberrations of Systems with Circular Pupils", Engineering and Laboratory Notes, Vol17, No. 3, August 1994, Optical Society of America.:V.N. Mahajan, Aberration Theory Made Simple, SPIE, Optical Engineering Press, 1991.
4. V.N. Mahajan, "Zernike Circle Polynomials and Optical Aberrations of Systems with Circular Pupils", Engineering and Laboratory Notes, Vol17, No. 3, August 1994, Optical Society of America.:V.N. Mahajan, Aberration Theory Made Simple, SPIE, Optical Engineering Press, 1991.
5. P. Dirksen, W de Laat, and H. Megens, "Latent image metrology for production wafer steppers", Proc. SPIE 2440, p.701, 1995.