Infrared spectra of photochemically grown suboxides and oxynitrides at the Si/SiO2 interface

Microelectronic Engineering

Volumn 72, Issue 1-4, 2004, Pages 201-206

  Hess, Peter ^a   Lambers, Jochen ^a  

^a UNIVERSITY OF HEIDELBERG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; INFRARED SPECTROSCOPY; INTERFACES (MATERIALS); MONOLAYERS; NITRIDES; PHOTOCHEMICAL REACTIONS; SILICA; SILICON;

PHOTOINDUCED GROWTH;

ULTRATHIN FILMS;

EID: 1842430542     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2003.12.037     Document Type: Conference Paper

References (24)

1. Chabal Y.J. Fundamental Aspects of Silicon Oxidation. 2001;Springer-Verlag, Berlin.
2. Green M.L., Gusev E.P., Degraeve R., Garfunkel E.L. J. Appl. Phys. 90:2001;2057-2121.
3. Kurokawa A., Nakamura K., Ichimura S., Moon D.W. Appl. Phys. Lett. 76:2000;493-495.
4. Cui Z., Madsen J.M., Takoudis C.G. J. Appl. Phys. 87:2000;8181-8186.
5. Stesmans A., Afanas'ev V.V. Appl. Phys. Lett. 77:2000;1469-1471.
6. Lambers J., Hess P. J. Appl. Phys. 94:2003;2937-2941.
7. Zhang J.-Y., Boyd I.W. Appl. Surf. Sci. 186:2002;64-68.
8. Wilk G.D., Brar B. IEEE Electron Device Lett. 20:1999;132-134.
9. Nishiguchi T., Nonaka H., Ichimura S., Morikawa Y., Kekura M., Miyamoto M. Appl. Phys. Lett. 81:2002;2190-2192.
10. Fukano A., Oyanagi H. J. Appl. Phys. 94:2003;3345-3349.
11. Lin J.J., Hwang D.W., Lee Y.T., Yang X. J. Chem. Phys. 109:1998;1758-1762.
12. Lambers J., Hess P. Lambda Highlights. 60:2002;7-9.
13. Pusel A., Wetterauer U., Hess P. Phys. Rev. Lett. 81:1998;645-648.
14. Pusel A., Hess P. Surf. Sci. 433-435:1999;74-78.
15. Okabe H. Photochemistry of Small Molecules. 1978;Wiley, New York. pp. 219-227.
16. Black G., Sharpless R.L., Slanger T.G., Lorents D.C. J. Chem. Phys. 62:1975;4266-4273.
17. Pai P.G., Chao S.S., Takagi Y., Lukovsky G. J. Vac. Sci. Technol. A. 4:1986;689-694.
18. Shabalov A.L., Feldmann M.S. Thin Solid Films. 151:1987;317-323.
19. Weldon M.K., Stefanov B.B., Raghavachari K., Chabal Y.J. Phys. Rev. Lett. 79:1997;2851-2854.
20. Ingo G.M., Zacchetti Z. High Temp. Sci. 28:1990;137-142.
21. Baraton M.I., Labbe J.C., Quintard P., Roult G. Mat. Res. Bull. 20:1985;1239-1250.
22. Diniz J.A., Sotero A.P., Lujan G.S., Tatsch P.J., Swart J.W. Nucl. Instr. Meth. B. 166-167:2000;64-69.
23. Shih A., Yeh S.-H., Lee S.-C., Yang T.R. J. Appl. Phys. 89:2001;5355-5361.
24. Queeney K.T., Weldon M.K., Chang J.P., Chabal Y.J., Gurevich A.B., Sapjeta J., Opila R.L. J. Appl. Phys. 87:2000;1322-1330.