Combined AFM and XPS analysis of complex surfaces

Surface and Coatings Technology

Volumn 174-175, Issue , 2003, Pages 286-289

  Yehya, M ^a   Kelly, P J ^a  

^a UNIVERSITY OF SALFORD   (United Kingdom)

Author keywords

Atomic force microscopy (AFM); Complex; Surfaces

Indexed keywords

ATOMIC FORCE MICROSCOPY; DATA REDUCTION; HYDROGEN; INDIUM COMPOUNDS; PHOSPHORUS COMPOUNDS; STOICHIOMETRY; SURFACE ROUGHNESS; X RAY PHOTOELECTRON SPECTROSCOPY;

PHOTOELECTRONS;

SURFACE TREATMENT;

COATING; INDUSTRIAL APPLICATION; PLASMA; SURFACE PROPERTY;

EID: 18344415520     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00650-9     Document Type: Article

References (10)

1. Gorbenko V. Gorban A. Shvets J. Vacuum 54 1 1999 179-182
2. Malherbe J.B. Odendaal R.Q. Appl Surf Sci 144 1 1999 192-200
3. Diniz J.A. Swart J.W. Jung K.B. Hong J. Pearton S.J. Solid State Electron 42 11 1998 1947-1951
4. Layberry R.L. Pearce C.G. Sullivan J.L. J. Phys. D 30 1997 3187-3196
5. Layberry R.L. Wronski Z. Pearce C.G. Sullivan J.L. J. Phys. D 32 1999 1857-1869
6. Yu W. Sullivan J.L. Saied S.O. Jones G.A.C. Nucl. Instrum. Methods Phys. Res. B Beam Interactions Mater. Atoms 135 1 1998 250-255
7. Yamada M. Chem. Phys. Lett. 280 1997 535-538
8. Feurprier Y. Cardinaud Ch. Turban G. Plasma Sources Sci. Technol. 6 1997 334-342
9. Feurprier Y. Cardinaud Ch. Grolleau B. Turban G. Plasma Sources Sci. Technol. 6 1997 561-568
10. Briggs D., Seah M.P. Auger and X-ray photoelectron spectroscopy. In: Practical Surface Analysis, 2nd ed, Vol. 1, John Wiley and Sons Ltd, Chichester, 1990