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Volumn 32, Issue 15, 1999, Pages 1857-1869

Model of capacitively coupled radio-frequency methane/hydrogen plasmas for III-V semiconductor etching applications

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC EXCITATION; ELECTRON ENERGY LEVELS; ELECTRONS; FLUXES; HYDROGEN; IONIZATION; IONS; MATHEMATICAL MODELS; METHANE; MOLECULAR VIBRATIONS; REACTIVE ION ETCHING; SURFACES;

EID: 0032641223     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/32/15/314     Document Type: Article
Times cited : (4)

References (49)
  • 24
    • 0345630915 scopus 로고
    • PhD Thesis Utrecht University
    • Kuypers A D 1989 PhD Thesis Utrecht University
    • (1989)
    • Kuypers, A.D.1
  • 34
    • 0345630912 scopus 로고
    • Excitation of molecules by electron impact in Christophou [2]
    • Stanford
    • Trajmar S and Cartwright D C1985 Excitation of molecules by electron impact in Christophou [2]. Updated by S Trajmar ICPEAC XIV (Stanford) p 77
    • (1985) ICPEAC XIV , pp. 77
    • Trajmar, S.1    Cartwright, D.C.2
  • 44
    • 0344768413 scopus 로고    scopus 로고
    • HYPERCHEM 1994 Hypercube Inc., 1115 N.W. 4th Street, Gainesville, Florida 32601, USA
    • HYPERCHEM 1994 Hypercube Inc., 1115 N.W. 4th Street, Gainesville, Florida 32601, USA


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.