Correlation of nanochemistry and electrical properties in Hf O2 films grown by metalorganic molecular-beam epitaxy

Applied Physics Letters

Volumn 86, Issue 10, 2005, Pages 1-3

  Moon, Tae Hyoung ^a   Ham, Moon Ho ^a   Myoung, Jae Min ^a  

^a Yonsei University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CAPACITANCE; CURRENT DENSITY; FILM GROWTH; MOLECULAR BEAM EPITAXY; PHOTOELECTRON SPECTROSCOPY; TEMPERATURE DISTRIBUTION; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

ANNEALING TEMPERATURE; CHEMICAL STATES; NANOCHEMISTRY; TEMPERATURE RANGE;

HAFNIUM COMPOUNDS;

EID: 17944373986     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1873049     Document Type: Article

References (15)

1. M. Houssa, M. Tuominen, M. Naili, V. Afanas'ev, A. Stesmans, S. Haukka, and M. M. Heynes, J. Appl. Phys. 87, 8615 (2000).
2. M. Copel, M. A. Gribelyuk, and E. Gusev, Appl. Phys. Lett. 76, 436 (2000).
3. L. F. Schneemeyer, R. B. Van Dover, and R. M. Fleming, Appl. Phys. Lett. 75, 1967 (1999).
4. S. J. Lee, H. F. Luan, W. P. Bai, C. H. Lee, T. S. Jeon, Y. Senzaki, D. Roberts, and D. L. Kwong, Tech. Dig. - Int. Electron Devices Meet. 2000, 31 (2000).
5. M.-H. Cho, Y. S. Roh, C. N. Whang, K. Jeong, S. W. Nahm, D.-H. Ko, J. H. Lee, N. I. Lee, and K. Fujihara, Appl. Phys. Lett. 81, 472 (2002).
6. M. R. Visokay, J. J. Chambers, A. L. P. Rotondaro, A. Shanware, and L. Colombo, Appl. Phys. Lett. 80, 3183 (2002).
7. J.-H. Hong, W.-J. Choi, and J.-M. Myoung, Microelectron. Eng. 70, 35 (2003).
8. J.-H. Hong, W.-J. Choi, D.-S. Kim, and J.-M. Myoung, J. Vac. Sci. Technol. B 21, 2105 (2003).
9. V. Consier, M. Oliver, G. Th́ret, and B. Andŕ, J. Vac. Sci. Technol. A 19, 2267 (2001).
10. O. Renault, D. Samour, J.-F. Damlencourt, D. Blin, F. Martin, S. Marthon, N. T. Barrett, and P. Besson, Appl. Phys. Lett. 81, 3627 (2002).
11. S. Toyoda, J. Okabayashi, H. Kumigashira, M. Oshima, K. Ono, M. Niwa, K. Usuda, and G. L. Liu, Appl. Phys. Lett. 84, 2328 (2004).
12. M.-J. Cho, H.-B. Park, J.-H. Park, C.-S. Hwang, J.-C. Lee, S.-J. Oh, J.-H. Jeong, K.-S. Hyun, H.-S. Kang, Y.-W. Kim, and J.-H. Lee, J. Appl. Phys. 94, 2563 (2003).
13. S. Sayan, E. Garfunkel, T. Nishimura, W. H. Schulte, T. Gustafsson, and G. D. Wilk, J. Appl. Phys. 89, 5243 (2001).
14. M. Copel and M. C. Reuter, Appl. Phys. Lett. 83, 3398 (2003).
15. J.-C. Lee, S.-J. Oh, M.-J. Cho, C.-S. Hwang, and R.-J. Jung, Appl. Phys. Lett. 84, 1305 (2004).