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Volumn 299-302, Issue PART 1, 2002, Pages 254-258
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Helium effusion, diffusion and precipitation as a probe of microstructure in hydrogenated amorphous silicon
a
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Author keywords
[No Author keywords available]
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Indexed keywords
CRYSTALLIZATION;
DIFFUSION;
DOPING (ADDITIVES);
HELIUM;
HYDROGENATION;
MICROSTRUCTURE;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
PRECIPITATION (CHEMICAL);
AMORPHOUS SILICON ALLOYS;
AMORPHOUS SILICON;
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EID: 17644443830
PISSN: 00223093
EISSN: None
Source Type: Journal
DOI: 10.1016/S0022-3093(01)01004-3 Document Type: Conference Paper |
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Times cited : (7)
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References (13)
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