Microstructure characterization of hydrogenated amorphous silicon films by rare gas effusion studies

Materials Research Society Symposium - Proceedings

Volumn 664, Issue , 2001, Pages

  Beyer, Wolfhard ^a  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CRYSTAL MICROSTRUCTURE; HELIUM; HIGH TEMPERATURE EFFECTS; HYDROGEN; HYDROGENATION; ION IMPLANTATION; NEON; PRECIPITATION (CHEMICAL); SPECTRUM ANALYSIS; SUBSTRATES;

RARE GAS EFFUSIONS;

AMORPHOUS FILMS;

EID: 0035559222     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-664-a9.2     Document Type: Conference Paper

References (12)