Microstructure characterization of amorphous silicon based alloys by inert gas effusion studies

Materials Research Society Symposium-Proceedings

Volumn 609, Issue , 2000, Pages A2341-A2346

  Beyer, W ^a   Camargo, S S ^b   Saleh, R ^c  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

^b FEDERAL UNIVERSITY OF RIO DE JANEIRO   (Brazil)

^c UNIVERSITY OF INDONESIA   (Indonesia)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; ANNEALING; CRYSTAL MICROSTRUCTURE; DIFFUSION; INERT GASES; SEMICONDUCTING FILMS;

GAS EFFUSION;

SILICON ALLOYS;

EID: 0034429061     PISSN: 02729172     EISSN: None     Source Type: Journal    
DOI: 10.1557/proc-609-a23.4     Document Type: Article

References (17)