Diffusion and effusion of hydrogen in microcrystalline silicon

Materials Research Society Symposium - Proceedings

Volumn 467, Issue , 1997, Pages 343-348

  Beyer, W ^a   Hapke, P ^a   Zastrow, U ^a  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; DEPOSITION; DIFFUSION IN SOLIDS; ELECTRON CYCLOTRON RESONANCE; HYDROGEN; HYDROGEN BONDS; HYDROGENATION; LIGHT ABSORPTION; PLASMA APPLICATIONS; TEMPERATURE;

EFFUSION; ELECTRON CYCLOTRON RESONANCE REACTOR; HYDROGEN STABILITY; SECONDARY ION MASS SPECTROSCOPY;

SEMICONDUCTING SILICON;

EID: 0031332818     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-467-343     Document Type: Conference Paper

References (14)