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Thin Solid Films

Volumn 482, Issue 1-2, 2005, Pages 232-236

Nanocrystalline diamond coating of silicon nitride ceramics by microwave plasma-assisted CVD

(6) Amaral, M a Mohasseb, F b Oliveira, F J a Benedic F b Silva, R F a Gicquel, A b

a UNIVERSITY OF AVEIRO (Portugal)

b UNIVERSITÉ PARIS 13 (France)

Author keywords

Film growth and characterization; MPACVD; Nanocrystalline diamond; Silicon nitride

Indexed keywords

CUTTING TOOLS; DEPOSITION; DIAMONDS; FILM GROWTH; GRAIN SIZE AND SHAPE; NANOSTRUCTURED MATERIALS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON NITRIDE;

DIAMOND GROWTH; FILM GROWTH AND CHARACTERIZATION; MPACVD; NANOCRYSTALLINE DIAMONDS;

CERAMIC MATERIALS;

EID: 17644394915 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2004.11.140 Document Type: Conference Paper

Times cited : (21)

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