Effect of intergranular phase of Si3N4 substrates on MPCVD diamond deposition

Surface and Coatings Technology

Volumn 151-152, Issue , 2002, Pages 521-525

  Tallaire, A ^a   Silva, V A ^a   Fernandes, A J S ^a   Costa, F M ^a   Silva, R F ^a  

^a UNIVERSITY OF AVEIRO   (Portugal)

Author keywords

Diamond; Grain growth; Intergranular phase; Nucleation; PACVD; Silicon nitride

Indexed keywords

ALUMINA; CERAMIC MATERIALS; CRYSTALS; SCANNING ELECTRON MICROSCOPY; SILICA; SILICON COMPOUNDS; SUBSTRATES; THERMAL CONDUCTIVITY;

BINARY SYSTEMS;

DIAMONDS;

CHEMICAL VAPOR DEPOSITION; DIAMOND; SILICON NITRIDE;

EID: 0036494927     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(01)01581-X     Document Type: Article

References (14)