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Volumn 337, Issue 1-2, 2002, Pages 236-240

Bias voltage influence on surface morphology of titanium nitride synthesized by dynamic nitrogen and titanium plasma immersion ion implantation and deposition

(4) Tian, Xiubo a Wang, Langping a Fu, Ricky King Yu a Chu, Paul K a

a CITY UNIVERSITY OF HONG KONG (Hong Kong)

Author keywords

Deposition processes; Ion bombardment; Ion implantation; Titanium nitride

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRIC POTENTIAL; GLOW DISCHARGES; ION IMPLANTATION; METALLIC FILMS; SILICON WAFERS; SYNTHESIS (CHEMICAL);

NITROGEN PLASMAS;

TITANIUM NITRIDE;

DEPOSITION; ION IMPLANTATION; MORPHOLOGY; SURFACE PROPERTY; TITANIUM NITRIDE;

EID: 0037176101 PISSN: 09215093 EISSN: None Source Type: Journal
DOI: 10.1016/S0921-5093(02)00030-8 Document Type: Article

Times cited : (8)

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