Identification of carbon and tantalum chemical states in metal-doped a-C:H films

Surface and Coatings Technology

Volumn 36, Issue 1-2, 1988, Pages 171-181

  Benndorf, C ^a   Grischke, M ^a   Koeberle, H ^a   Memming, R ^a   Brauer, A ^a   Thieme, F ^a  

^a UNIVERSITY OF HAMBURG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CONDUCTIVITY; SPECTROSCOPIC ANALYSIS; SURFACES; X-RAY ANALYSIS;

AMORPHOUS HYDROGENATED CARBON FILMS; BINDING ENERGY; TANTALUM DOPING; X-RAY DIFFRACTION;

CARBON;

EID: 0024137356     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/0257-8972(88)90147-8     Document Type: Article

References (11)

1. Tribological and electrical properties of metal-containing hydrogenated carbon films
2. An x-ray photoelectron spectroscopy study of poly(methylmethacrylate) and poly(α-methylstyrene) surfaces irradiated by excimer lasers
3. Orbach type reorientation processes in the paraelastic relaxation of O2− in KCl
4. Stability of oxides grown on tantalum silicide surfaces