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Volumn , Issue , 2004, Pages 357-360

Influence of an accumulation back-gate voltage on the low-frequency noise spectra of 0.13 μm fully-depleted SOI MOSFETs fabricated on ELTRAN and UNIBOND wafers

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; ELECTRIC IMPEDANCE; INTERFACES (MATERIALS); MOSFET DEVICES; SILICON ON INSULATOR TECHNOLOGY; SPURIOUS SIGNAL NOISE;

EID: 17644370377     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (1)

References (9)
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    • Simoen, E.1    Claeys, C.2
  • 2
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    • W. Jin, P.C.H. Chan, S.K.H. Fung, and P.K. Ko, "Shot-noise-induced excess low-frequency noise in floating-body partially depleted SOI MOSFET's", IEEE Trans. Electron Devices, vol. 46, pp. 1180-1185, June 1999.
    • (1999) IEEE Trans. Electron Devices , vol.46 , pp. 1180-1185
    • Jin, W.1    Chan, P.C.H.2    Fung, S.K.H.3    Ko, P.K.4
  • 3
    • 0036637862 scopus 로고    scopus 로고
    • SOI n-MOSFET low-frequency noise measurements and modeling from room temperature up to 250°C
    • July
    • V. Dessard, B. Iňíguez, S. Adriaensen, and D. Flandre, "SOI n-MOSFET low-frequency noise measurements and modeling from room temperature up to 250°C," IEEE Trans. Electron Devices, vol. 49, pp. 1289-1295, July 2002.
    • (2002) IEEE Trans. Electron Devices , vol.49 , pp. 1289-1295
    • Dessard, V.1    Iňíguez, B.2    Adriaensen, S.3    Flandre, D.4
  • 4
    • 0037004954 scopus 로고    scopus 로고
    • Gate-induced floating body effect excess noise in partially depleted SOI MOSFETs
    • Dec.
    • F. Dieudonné, J. Jomaah, and F. Balestra, "Gate-induced floating body effect excess noise in partially depleted SOI MOSFETs," IEEE Electron Device Lett., vol. 23, pp. 737-739, Dec. 2002.
    • (2002) IEEE Electron Device Lett. , vol.23 , pp. 737-739
    • Dieudonné, F.1    Jomaah, J.2    Balestra, F.3
  • 5
    • 0037451258 scopus 로고    scopus 로고
    • Low-frequency noise overshoot in ultrathin gate oxide silicon-on-insulator metal-oxide-semiconductor field-effect transistors
    • March
    • A. Mercha, E. Simoen, H. van Meer, and C. Claeys, "Low-frequency noise overshoot in ultrathin gate oxide silicon-on-insulator metal-oxide-semiconductor field-effect transistors," Appl Phys Lett., vol. 82, pp. 1790-1792, March 2003.
    • (2003) Appl Phys Lett. , vol.82 , pp. 1790-1792
    • Mercha, A.1    Simoen, E.2    Van Meer, H.3    Claeys, C.4
  • 6
    • 0142023818 scopus 로고    scopus 로고
    • Electron valence band tunneling-induced Lorentzian noise in deep submicron silicon-on-insulator metal-oxide-semiconductor field-effect transistors
    • Oct.
    • N.B. Lukyanchikova, M.V. Petrichuk, N.P. Garbar, A. Mercha, E. Simoen, and C. Claeys, "Electron Valence Band tunneling-induced Lorentzian noise in deep submicron Silicon-on-Insulator Metal-Oxide-Semiconductor Field-Effect Transistors," J. Appl. Phys., vol. 94, pp. 4461-4469, Oct. 2003.
    • (2003) J. Appl. Phys. , vol.94 , pp. 4461-4469
    • Lukyanchikova, N.B.1    Petrichuk, M.V.2    Garbar, N.P.3    Mercha, A.4    Simoen, E.5    Claeys, C.6
  • 7
    • 0347270399 scopus 로고    scopus 로고
    • Explaining the parameters of the electron valence band tunneling related Lorentzian noise in fully depleted SOI MOSFETs
    • Dec.
    • E. Simoen, A. Mercha, J.M. Raff, C. Claeys, N. Lukyanchikova, and N. Garbar, "Explaining the parameters of the electron valence band tunneling related Lorentzian noise in fully depleted SOI MOSFETs," IEEE Electron Device Lett., vol. 24, pp. 751-754, Dec. 2003.
    • (2003) IEEE Electron Device Lett. , vol.24 , pp. 751-754
    • Simoen, E.1    Mercha, A.2    Raff, J.M.3    Claeys, C.4    Lukyanchikova, N.5    Garbar, N.6
  • 8
    • 1242265409 scopus 로고    scopus 로고
    • Short-channel effects in the Lorentzian noise induced by the EVB tunneling in partially-depleted SOI MOSFETs
    • N. Lukyanchikova, N. Garbar, A. Smolanka, E. Simoen, A. Mercha, and C. Claeys, "Short-channel effects in the Lorentzian noise induced by the EVB tunneling in partially-depleted SOI MOSFETs," Solid-State Electron., vol. 48, pp. 747-758, 2004.
    • (2004) Solid-state Electron. , vol.48 , pp. 747-758
    • Lukyanchikova, N.1    Garbar, N.2    Smolanka, A.3    Simoen, E.4    Mercha, A.5    Claeys, C.6
  • 9
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    • Excess Lorentzian noise in partially-depleted SOI nMOSFETs induced by an accumulation back-gate bias
    • submitted for publication
    • N. Lukyanchikova, N. Garbar, A. Smolanka, E. Simoen and C. Claeys, "Excess Lorentzian noise in partially-depleted SOI nMOSFETs induced by an accumulation back-gate bias," submitted for publication in IEEE Electron Device Lett.
    • IEEE Electron Device Lett.
    • Lukyanchikova, N.1    Garbar, N.2    Smolanka, A.3    Simoen, E.4    Claeys, C.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.