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Volumn 39, Issue 7, 1996, Pages 949-960

The low-frequency noise behaviour of silicon-on-insulator technologies

(2)  Simoen, E a   Claeys, C a  

a IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

DEFECTS; DIELECTRIC MATERIALS; MOSFET DEVICES; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICE STRUCTURES; SPURIOUS SIGNAL NOISE; SUBSTRATES;

EID: 0030193606     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/0038-1101(95)00427-0     Document Type: Review
Times cited : (59)

References (117)
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    • McWhorter, A.L.1
  • 9
    • 0347678126 scopus 로고
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    • G. W. Cullen, M. T. Duffy and A. C. Ipri, in Proc. 6th Int. Symp. on SOI Technology and Devices (Edited by S. Cristoloveanu, K. Izumi, P. F. L. Hemment and H. Hosack), Vol. PV94-11, pp. 5-15. Electrochemical Society, Pennington, NJ (1994).
    • (1994) Proc. 6th Int. Symp. on SOI Technology and Devices , vol.PV94-11 , pp. 5-15
    • Cullen, G.W.1    Duffy, M.T.2    Ipri, A.C.3
  • 12
    • 0000913824 scopus 로고
    • Edited by S. Cristoloveanu, K. Izumi, P. F. L. Hemment and H. Hosack, Electrochemical Society, Pennington, NJ
    • T. Tsuchiya, T . Ohno, and Y. Kado, in Proc. 6th Int. Symp. on SOI Technology and Devices (Edited by S. Cristoloveanu, K. Izumi, P. F. L. Hemment and H. Hosack), Vol. PV94-11, pp. 401-412. Electrochemical Society, Pennington, NJ (1994).
    • (1994) Proc. 6th Int. Symp. on SOI Technology and Devices , vol.PV94-11 , pp. 401-412
    • Tsuchiya, T.1    Ohno, T.2    Kado, Y.3
  • 14
    • 3943049370 scopus 로고
    • Edited by W. E. Bailey, The Electrochemical Society Softbound Series, Pennington, NJ
    • H. Hosack, in Proc. 5th Int. Symp. on SOI Technology and Devices (Edited by W. E. Bailey), Vol. 92-13, pp. 5-18. The Electrochemical Society Softbound Series, Pennington, NJ (1992).
    • (1992) Proc. 5th Int. Symp. on SOI Technology and Devices , vol.92 , Issue.13 , pp. 5-18
    • Hosack, H.1
  • 24
    • 85029980101 scopus 로고
    • Edited by J. Sikula and P. Schauer, Technical University, Brno
    • C. Claeys and E. Simoen, in Proc. of the Int. NODITO Workshop (Edited by J. Sikula and P. Schauer), pp. 74-81. Technical University, Brno (1995).
    • (1995) Proc. of the Int. NODITO Workshop , pp. 74-81
    • Claeys, C.1    Simoen, E.2
  • 107
    • 85029993409 scopus 로고
    • (Edited by S. Cristoloveanu, K. Izumi, P. L. F. Hemment and H. Hosack) The Electrochemical Society Proceedings, Electrochemical Society, Pennington, NJ
    • V. Berland, A. Touboul and O. Flament, in Proc. 6th Int. Symp. on Silicon-on-Insulator Technology and Devices (Edited by S. Cristoloveanu, K. Izumi, P. L. F. Hemment and H. Hosack) The Electrochemical Society Proceedings, Vol. 94-11, pp. 390-395. Electrochemical Society, Pennington, NJ (1994).
    • (1994) Proc. 6th Int. Symp. on Silicon-on-Insulator Technology and Devices , vol.94 , Issue.11 , pp. 390-395
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.