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Volumn 88-91, Issue , 1998, Pages 747-755

In situ observation of thermal and photon-induced reactions on Si surfaces by ultraviolet photoelectron spectroscopy

Author keywords

Etching; Gas source molecular beam epitaxy; Oxidation; Photon induced reactions; Silicon; Ultraviolet photoelectron spectrocopy

Indexed keywords

CHEMICAL REACTIONS; DECOMPOSITION; ETCHING; MOLECULAR BEAM EPITAXY; OXIDATION; RADIATION EFFECTS; SILICA; SILICON; SYNCHROTRON RADIATION;

EID: 17544403389     PISSN: 03682048     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0368-2048(97)00261-2     Document Type: Article
Times cited : (11)

References (45)
  • 28
    • 0002742893 scopus 로고
    • S.M. Sze (Ed.), McGraw-Hill, New York
    • L.E. Katz, in: S.M. Sze (Ed.), VLSI Technology, McGraw-Hill, New York, 1988, p. 98.
    • (1988) VLSI Technology , pp. 98
    • Katz, L.E.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.