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Volumn 36, Issue 12 SUPPL. B, 1997, Pages 7699-7705
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In situ observation of photon-stimulated hydrogen removal on a HF-passivated Si(111) surface by ultraviolet photoelectron spectroscopy using synchrotron radiation
d
NTT CORPORATION
(Japan)
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Author keywords
HF passivation; Hydrogen adsorption state; Hydrogen removal; In situ observation; PSD; Si(111); Synchrotron radiation; UPS
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Indexed keywords
GAS ADSORPTION;
HYDROGEN;
PASSIVATION;
PHOTOELECTRON SPECTROSCOPY;
PHOTONS;
REACTION KINETICS;
SYNCHROTRON RADIATION;
ULTRAVIOLET RADIATION;
ULTRAVIOLET SPECTROSCOPY;
PHOTON STIMULATED HYDROGEN REMOVAL;
ULTRAVIOLET PHOTOELECTRON SPECTROSCOPY (UPS);
SEMICONDUCTING SILICON;
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EID: 0031362728
PISSN: 00214922
EISSN: None
Source Type: Journal
DOI: 10.1143/jjap.36.7699 Document Type: Article |
Times cited : (4)
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References (31)
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