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Volumn 36, Issue 12 SUPPL. B, 1997, Pages 7699-7705

In situ observation of photon-stimulated hydrogen removal on a HF-passivated Si(111) surface by ultraviolet photoelectron spectroscopy using synchrotron radiation

Author keywords

HF passivation; Hydrogen adsorption state; Hydrogen removal; In situ observation; PSD; Si(111); Synchrotron radiation; UPS

Indexed keywords

GAS ADSORPTION; HYDROGEN; PASSIVATION; PHOTOELECTRON SPECTROSCOPY; PHOTONS; REACTION KINETICS; SYNCHROTRON RADIATION; ULTRAVIOLET RADIATION; ULTRAVIOLET SPECTROSCOPY;

EID: 0031362728     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.7699     Document Type: Article
Times cited : (4)

References (31)
  • 1
    • 5244305531 scopus 로고    scopus 로고
    • Applications of Synchrotron Radiation to Material Sciences
    • and references therein
    • For example, a special issue focused on "Applications of Synchrotron Radiation to Material Sciences", Optoelectronics - Devices & Technol. - 11 (1996) pp. 1-140 and references therein.
    • (1996) Optoelectronics - Devices & Technol. , vol.11 , Issue.SPEC. ISSUE , pp. 1-140


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.