Kinetics of dissociative adsorption of dichlorosilane on Si(100)2 × 1

Applied Surface Science

Volumn 107, Issue , 1996, Pages 68-74

  Sakamoto, Hitoshi ^a   Takakuwa, Yuji ^b   Hori, Toyokazu ^b,c   Horie, Tetsuhiro ^a,b   Suemitsu, Maki ^b   Miyamoto, Nobuo ^b  

^a MITSUBISHI HEAVY INDUSTRIES LTD   (Japan)

^b TOHOKU UNIVERSITY   (Japan)

^c HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; CHEMICAL BONDS; DECOMPOSITION; DESORPTION; DISSOCIATION; MATHEMATICAL MODELS; PHOTOELECTRON SPECTROSCOPY; REACTION KINETICS; SILANES; THERMAL EFFECTS; ULTRAVIOLET SPECTROSCOPY;

DICHLOROSILANES; ULTRAVIOLET PHOTOELECTRON SPECTROSCOPY (UPS);

SEMICONDUCTING SILICON;

EID: 0030566228     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(96)00485-0     Document Type: Article

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