Ion beam assisted deposition of tantalum nitride thin films for vacuum microelectronics devices

Surface and Coatings Technology

Volumn 158-159, Issue , 2002, Pages 729-731

  Gotoh, Y ^a   Kagamimori, K ^a   Tsuji, H ^a   Ishikawa, J ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

Composition; Ion beam assisted deposition; Tantalum nitride; Work function

Indexed keywords

THIN FILMS; VACUUM; X RAY DIFFRACTION;

MICROELECTRONICS DEVICES;

ION BEAM ASSISTED DEPOSITION;

IRRADIATION;

EID: 17144447330     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(02)00262-1     Document Type: Article

References (16)