Influence of ambient nitrogen pressure on the property of zirconium nitride thin films in ion beam assisted deposition

Proceedings of the International Conference on Ion Implantation Technology

Volumn 2, Issue , 1999, Pages 1125-1128

  Gotoh, Y ^a   Shiigi, T ^a   Nagao, M ^a   Tsuji, H ^a   Ishikawa, J ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE MATERIALS; DEPOSITION; ELECTRIC CONDUCTIVITY OF SOLIDS; ION BEAMS; NITROGEN; PRESSURE EFFECTS; SUBSTRATES; THIN FILMS; ZIRCONIUM COMPOUNDS;

ION BEAM ASSISTED DEPOSITION (IBAD);

METALLIC FILMS;

EID: 0033349625     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)