Area-selective formation of macropore array by anisotropic electrochemical etching on an n-Si(100) surface in aqueous HF solution

Journal of Physical Chemistry B

Volumn 109, Issue 12, 2005, Pages 5724-5727

  Homma, Takayuki ^a   Sato, Hirotaka ^a   Mori, Kentaro ^a   Osaka, Tetsuya ^a   Shoji, Shuichi ^a  

^a WASEDA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; CHEMICAL VAPOR DEPOSITION; DIFFUSION; ELECTROCHEMISTRY; ETCHING; PHOTOLITHOGRAPHY; SCANNING ELECTRON MICROSCOPY; SOLUTIONS;

ELECTROCHEMICAL ETCHING; MACROPORE ARRAY; MACROPORES; MICROPATTERNS;

SEMICONDUCTING SILICON;

EID: 17144373306     PISSN: 15206106     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp045822n     Document Type: Article

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