Formation of through-holes on silicon wafer by optical excitation electropolishing method

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 39, Issue 2 A, 2000, Pages 378-386

  Satoh, Akinobu ^a  

^a FUJIKURA LTD   (Japan)

Author keywords

Deep capillary; Optical excitation electropolishing; Pit; Through hole

Indexed keywords

ANODES; ASPECT RATIO; CAPILLARITY; CATHODE FOLLOWERS; ELECTROLYTES; ELECTROLYTIC POLISHING; MICROSTRUCTURE; PLATINUM;

OPTICAL EXCITATION ELECTROPOLISHING;

SILICON WAFERS;

EID: 0033885556     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.378     Document Type: Article

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