Characterization of crystalline carbon nitride films deposited on Si and Si3N4/Si substrate by RF magnetron sputtering system with DC bias

Journal of Electroceramics

Volumn 13, Issue 1-3, 2004, Pages 321-326

  Lee, J G ^a   Lee, S P ^a  

^a Kyungnam University   (South Korea)

Author keywords

Carbon nitride; Crystalline Morphology; Growth rate; RF magnetron sputter

Indexed keywords

CARBON NITRIDE; CRYSTALLINE MATERIALS; DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MAGNETRON SPUTTERING; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; THERMODYNAMIC STABILITY; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

CAPACITIVE TARGETS; CHAMBER TEMPERATURE; GROWTH RATE; SCANNING PROBE MICROSCOPY;

THIN FILMS;

EID: 17044403750     PISSN: 13853449     EISSN: None     Source Type: Journal    
DOI: 10.1007/s10832-004-5120-0     Document Type: Conference Paper

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