Molecular beam epitaxy of SrTiO3 films on Si(100)-2×1 with SrO buffer layer

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 8, 1998, Pages 4454-4459

  Tambo, Toyokazu ^a   Nakamura, Takuya ^a   Maeda, Kazuo ^a   Ueba, Hiromu ^a   Tatsuyama, Chiei ^a  

^a UNIVERSITY OF TOYAMA   (Japan)

Author keywords

Atomic force microscope; Molecular beam epitaxy; Reflection high energy electron diffraction; Si(100) substrate; SrO buffer layer; SrTiO3; X ray diffraction

Indexed keywords

ATOMIC FORCE MICROSCOPY; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; THIN FILMS; X RAY DIFFRACTION;

BUFFER LAYERS;

MOLECULAR BEAM EPITAXY;

EID: 0032131248     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.4454     Document Type: Article

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