Recent developments on MOCVD of ferroelectric thin films

Journal of Electroceramics

Volumn 13, Issue 1-3, 2004, Pages 15-22

  Otani, Yohei ^a   Okamura, Soichiro ^a   Shiosaki, Tadashi ^a  

^a NARA INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

6 inch wafer; Cocktail source; Liquid delivery; MOCVD; PZT

Indexed keywords

ANNEALING; DEPOSITION; ELECTRODES; IRIDIUM COMPOUNDS; LEAD COMPOUNDS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; RANDOM ACCESS STORAGE; SILICON WAFERS; TITANIUM COMPOUNDS; ZIRCONIUM COMPOUNDS;

6 INCH WAFERS; COCKTAIL SOURCE; LIQUID DELIVERY; PZT;

FERROELECTRIC THIN FILMS;

EID: 17044380595     PISSN: 13853449     EISSN: None     Source Type: Journal    
DOI: 10.1007/s10832-004-5069-z     Document Type: Conference Paper

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