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Volumn 11, Issue 4, 2003, Pages 321-326

InNAs - A new optoelectronic material for mid-infrared applications

Author keywords

Dilute nitrides; Dimethylhydrazine; InNAs; Mid infrared emitters; MOCVD; Multiple quantum wells

Indexed keywords

ELECTRON ENERGY LOSS SPECTROSCOPY; EPITAXIAL GROWTH; INFRARED DEVICES; LASERS; LATTICE CONSTANTS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; OPTOELECTRONIC DEVICES; PHASE COMPOSITION; PHOTOLUMINESCENCE; SEMICONDUCTOR QUANTUM WELLS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

EID: 1642577189     PISSN: 12303402     EISSN: 18963757     Source Type: Journal    
DOI: None     Document Type: Conference Paper
Times cited : (21)

References (17)
  • 3
    • 0035200459 scopus 로고    scopus 로고
    • Recent progress in quantum cascade lasers and applications
    • C. Gmachl, F. Capasso, D.L. Sivco, and A.Y. Cho, "Recent progress in quantum cascade lasers and applications", Rep. Progress Phys. 64, 1533-1601 (2001).
    • (2001) Rep. Progress Phys. , vol.64 , pp. 1533-1601
    • Gmachl, C.1    Capasso, F.2    Sivco, D.L.3    Cho, A.Y.4
  • 5
    • 0031095303 scopus 로고    scopus 로고
    • Tight-binding calculation of electronic structures of InNAs ordered alloys
    • T. Yang, S. Nakajima, and S. Sakai, "Tight-binding calculation of electronic structures of InNAs ordered alloys", Jpn. J. Appl. Phys. 36, L320 (1997).
    • (1997) Jpn. J. Appl. Phys. , vol.36
    • Yang, T.1    Nakajima, S.2    Sakai, S.3
  • 6
    • 0031078861 scopus 로고    scopus 로고
    • MOCVD growth of InAsN for infrared applications
    • H. Naoi, Y. Naoi, and S. Sakai, "MOCVD growth of InAsN for infrared applications", Solid-State Electron. 41, 319-321 (1997).
    • (1997) Solid-State Electron. , vol.41 , pp. 319-321
    • Naoi, H.1    Naoi, Y.2    Sakai, S.3
  • 7
    • 0035087934 scopus 로고    scopus 로고
    • Growth of InAsN/InGaAs(P) quantum wells on InP by gas source molecular beam epitaxy
    • J.S. Wang, H.H. Lin, L.W. Song, and G.R. Chen, "Growth of InAsN/InGaAs(P) quantum wells on InP by gas source molecular beam epitaxy", J. Vac. Sci. & Technol. B19, 202 (2001).
    • (2001) J. Vac. Sci. & Technol. , vol.B19 , pp. 202
    • Wang, J.S.1    Lin, H.H.2    Song, L.W.3    Chen, G.R.4
  • 12
    • 0035152091 scopus 로고    scopus 로고
    • Growth of InNAs by low-pressure metalorganic chemical vapour deposition employing microwave-cracked nitrogen and in situ generated arsine radicals
    • H. Naoi, D. M. Shaw, Y. Naoi, G.J. Collins, and S. Sakai, "Growth of InNAs by low-pressure metalorganic chemical vapour deposition employing microwave-cracked nitrogen and in situ generated arsine radicals", J. Cryst. Growth 222, 511-517 (2001).
    • (2001) J. Cryst. Growth , vol.222 , pp. 511-517
    • Naoi, H.1    Shaw, D.M.2    Naoi, Y.3    Collins, G.J.4    Sakai, S.5
  • 13
    • 0000015619 scopus 로고    scopus 로고
    • Microstructure and composition of InAsN alloys grown by plasma-source molecular beam epitaxy
    • R. Beresford, K.S. Stevens, and A.F. Schwartzman, "Microstructure and composition of InAsN alloys grown by plasma-source molecular beam epitaxy", J. Vac. Sci. & Technol. B16, 1293 (1998).
    • (1998) J. Vac. Sci. & Technol. , vol.B16 , pp. 1293
    • Beresford, R.1    Stevens, K.S.2    Schwartzman, A.F.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.