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Volumn , Issue , 2002, Pages 653-654

Characterization of MOCVD-grown InNAs/GaAs quantum wells

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL GROWTH; LATTICE CONSTANTS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PHOTOLUMINESCENCE; SEMICONDUCTING GALLIUM ARSENIDE; SEMICONDUCTING INDIUM COMPOUNDS; X RAY DIFFRACTION;

EID: 0036459044     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (1)

References (6)
  • 1
    • 0035152091 scopus 로고    scopus 로고
    • Growth of InNAs by low-pressure metalorganic chemical vapor deposition employing microwave-cracked nitrogen and in situ generated arsine radicals
    • H. Naoi, D.M. Shaw, Y. Naoi, G.J. Collins, and S. Sakai, "Growth of InNAs by low-pressure metalorganic chemical vapor deposition employing microwave-cracked nitrogen and in situ generated arsine radicals", J. Cryst. Growth 222, 511-517 (2001).
    • (2001) J. Cryst. Growth , vol.222 , pp. 511-517
    • Naoi, H.1    Shaw, D.M.2    Naoi, Y.3    Collins, G.J.4    Sakai, S.5
  • 2
    • 0030385606 scopus 로고    scopus 로고
    • Lattice-matched InAsN (x = 0.38) on GaAs grown by molecular beam epitaxy
    • III-Nitride, SiC and Diamond Materials for Electronic Devices, D.K. Gaskill, C.D. Brandt, and R.J. Nemanich, eds., 8-12 April 1996, San Francisco, CA
    • Y.C. Kao, T.P.E. Broekaert, H.Y. Liu, S. Tang, I.H. Ho, and G.B. Stringfellow, "Lattice-matched InAsN (x = 0.38) on GaAs grown by molecular beam epitaxy", in III-Nitride, SiC and Diamond Materials for Electronic Devices, D.K. Gaskill, C.D. Brandt, and R.J. Nemanich, eds., 8-12 April 1996, San Francisco, CA, MRS Symp. Proc. 423, 335-340 (1996).
    • (1996) MRS Symp. Proc. , vol.423 , pp. 335-340
    • Kao, Y.C.1    Broekaert, T.P.E.2    Liu, H.Y.3    Tang, S.4    Ho, I.H.5    Stringfellow, G.B.6
  • 3
    • 0000015619 scopus 로고    scopus 로고
    • Microstructure and composition of InAsN alloys grown by plasma-source molecular beam epitaxy
    • R. Beresford, K.S. Stevens, and A.F. Schwartzman, "Microstructure and composition of InAsN alloys grown by plasma-source molecular beam epitaxy", J. Vac. Sci. & Technol. B 16, 1293-1296 (1998).
    • (1998) J. Vac. Sci. & Technol. B , vol.16 , pp. 1293-1296
    • Beresford, R.1    Stevens, K.S.2    Schwartzman, A.F.3
  • 4
    • 0035087934 scopus 로고    scopus 로고
    • Growth of InAsN/InGaAs(P) quantum wells on InP by gas source molecular beam epitaxy
    • J.-S. Wang, H.-H. Lin, L.-W. Song, and G.-R. Chen, "Growth of InAsN/InGaAs(P) quantum wells on InP by gas source molecular beam epitaxy", J. Vac. Sci. & Technol. B 19, 202-206 (2001).
    • (2001) J. Vac. Sci. & Technol. B , vol.19 , pp. 202-206
    • Wang, J.-S.1    Lin, H.-H.2    Song, L.-W.3    Chen, G.-R.4
  • 5
    • 0031095303 scopus 로고    scopus 로고
    • Tight-binding calculation of electronic structures of InNAs ordered alloys
    • T. Yang, S. Nakajima, and S. Sakai, "Tight-binding calculation of electronic structures of InNAs ordered alloys", Jpn. J. Appl. Phys., Pt. 2 36, L320-L322 (1997).
    • (1997) Jpn. J. Appl. Phys., Pt. 2 , vol.36
    • Yang, T.1    Nakajima, S.2    Sakai, S.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.