Investigation of Phase Variation Impact on CPL PSM for Low k1 Imaging

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5130, Issue , 2003, Pages 804-811

  Lin, Chun Hung ^a   Hsu, Michael ^b   Hsieh, Frank ^a   Lin, Shu Yi ^a   Hsu, Stephen ^b   Shi, Xuelong ^b   Van Den Broeke, Doug ^b   Chen, J Fung ^b   Tang, F C ^c   Hsieh, W A ^c   Huang, C Y ^c  

^a Toppan Chunghwa Electronics Co Ltd   (Taiwan)

^b ASML US Inc   (United States)

^c WINBOND ELECTRONICS CORPORATION   (Taiwan)

Author keywords

AFM; Chromeless PSM; CPL; FIB; Phase shifting mask; PSM; SEM

Indexed keywords

ABERRATIONS; ATOMIC FORCE MICROSCOPY; ELECTROMAGNETIC WAVE ATTENUATION; ERROR ANALYSIS; ETCHING; IMPACT TESTING; LENSES; LITHOGRAPHY; MASKS; PHASE SHIFT; QUARTZ; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS;

AFM; CHROMELESS PHASE LITHOGRAPHY (CPL); CHROMELESS PSM; FIB; PHASE SHIFTING MASKS;

IMAGING SYSTEMS;

EID: 1642474048     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.504176     Document Type: Conference Paper

References (7)

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7. Stiven Fan, Michael Hsu et. al., "Phase defect repair for the chromeless phase lithography (CPL) mask", SPIE Vol. 4889, pp 221-231, 2002