Mask design optimization for 70 nm technology node using chromeless phase lithography (CPL) based on 100% transmission phase shifting mask

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4754, Issue , 2002, Pages 361-372

  Chen, J Fung ^a   Van Den Broeke, Doug ^a   Hsu, Michael ^a   Laidig, Tom ^a   Wampler, Kurt E ^a   Shi, Xuelong ^a   Hsu, Stephen ^a   Shafer, Ted ^a  

^a ASML US Inc   (United States)

Author keywords

100 transmission PSM; Attenuated PSM; Chromeless Phase Lithography; CLM; CPL; PSM

Indexed keywords

ATTENUATION; LIGHT TRANSMISSION; LITHOGRAPHY; OPTIMIZATION; PHASE SHIFT;

CHROMELESS PHASE LITHOGRAPHY (CPL);

MASKS;

EID: 0036456833     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.476927     Document Type: Conference Paper

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