Phase defect repair for the chromeless phase lithography (CPL) mask

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4889, Issue 1, 2002, Pages 221-231

  Fan, Steven ^a   Hsu, Michael ^b   Tseng, Alex ^a   Fung Chen, J ^b   Van Den Broeke, Doug ^b   Lei, Henrry ^c   Hsu, Stephen ^b   Shi, Xuelong ^b  

^a Toppan Chunghwa Electronics Co Ltd   (Taiwan)

^b ASML US Inc   (United States)

^c UNITED MICROELECTRONICS CORPORATION   (Taiwan)

Author keywords

AFM; CPL; FIB; GAE; Phase shifting mask; PSM; SEM

Indexed keywords

ATOMIC FORCE MICROSCOPY; ETCHING; PHASE SHIFT; PHOTOLITHOGRAPHY; SCANNING ELECTRON MICROSCOPY;

CHROMELESS PHASE LITHOGRAPHY (CPL) MASKS;

MASKS;

EID: 0038642181     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.467486     Document Type: Conference Paper

References (6)

1. 1 Chromeless Phase Lithography (CPL) technology", SPIE Vol. 4754, pp 373-383, 2002
2. J. Fung Chen et .al., "Binary halftone chromeless PSM technology for λ/4 optical lithography", SPIE Vol. 4346, pp 515-533, 2001
3. Chungwei Hsu et .al., "Patterning Half-wavelength DRAM cell using Chromeless Phase Lithography (CPL)", SPIE Vol. 4691, pp 76-88, 2002
4. Douglas et .al., "Complex 2D pattern lithography at λ/4 resolution using Chromeless Phase Lithography (CPL)", SPIE Vol. 4691, pp 196-214, 2002
5. Douglas et .al., "Maskdesign optimization for the 70 nm technology node using Chromeless Phase Lithography (CPL) based on 100% transmission phase shifting mask", SPIE Vol. 4754, pp 361-372, 2002
6. Chris Marotta et .al., "Repair and imaging of 193nm MoSiON phase shift photomasks", SPIE Vol. 4562, pp 1161-1171, 2002