Two-dimensional simulations of temperature fields of the reactor wall during hot-filament CVD diamond film growth over a large area

Modelling and Simulation in Materials Science and Engineering

Volumn 12, Issue 2, 2004, Pages 325-335

  Wang, A Y ^a   Sun, C ^a   Cao, H T ^a   Ji, A L ^a   Huang, R F ^a   Wen, L S ^a  

^a INSTITUTE OF METAL RESEARCH   (China)

Author keywords

[No Author keywords available]

Indexed keywords

HOT-FILAMENT CHEMICAL VAPOR DEPOSITION (HFCVD); THERMAL FLOW MODEL;

BOUNDARY CONDITIONS; CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; ENERGY TRANSFER; FILM GROWTH; FINITE VOLUME METHOD; HEAT CONDUCTION; HEAT CONVECTION; HEAT RADIATION; HOT WORKING; MATHEMATICAL MODELS; NUCLEATION; PARTIAL DIFFERENTIAL EQUATIONS; TEMPERATURE DISTRIBUTION;

DIAMOND FILMS;

EID: 1642399107     PISSN: 09650393     EISSN: None     Source Type: Journal    
DOI: 10.1088/0965-0393/12/2/012     Document Type: Article

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