Simulations of temperature field in HFCVD diamond films with large area

Jinshu Xuebao/Acta Metallurgica Sinica

Volumn 37, Issue 11, 2001, Pages 1217-1222

  Wang, Aiying ^a   Sun, Chao ^a   Wang, Bing ^a   Gong, Jun ^a   Huang, Rongfang ^a   Wen, Lishi ^a  

^a INSTITUTE OF METAL RESEARCH   (China)

Author keywords

Diamond films; HFCVD; Simulation; Temperature field

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DEPOSITION; DIAMOND DEPOSITS; DIAMONDS; TEMPERATURE; TEMPERATURE DISTRIBUTION;

DEPOSITION PARAMETERS; HFCVD; HOT-FILAMENT CHEMICAL VAPOR DEPOSITION; MAXIMUM TEMPERATURE; NO MORE THAN 5; SIMULATION; SUBSTRATE TEMPERATURE; TECHNOLOGICAL PARAMETERS;

DIAMOND FILMS;

EID: 0042317101     PISSN: 04121961     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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