Simulation of the influence of the filament arrangement on the gas phase during hot filament chemical vapor deposition of diamond films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 3, 2000, Pages 860-863

  Song, G H ^a,b   Sun, C ^a   Huang, R F ^a   Wen, L S ^a  

^a INSTITUTE OF METAL RESEARCH   (China)

^b Shenyang Polytechnic University   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; CURRENT DENSITY; NUCLEATION; TEMPERATURE DISTRIBUTION;

HOT FILAMENT CHEMICAL VAPOR DEPOSITION;

DIAMOND FILMS;

EID: 0034188037     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582267     Document Type: Article

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