The simulation of the space fields of gas physical parameters during HFCVD diamond films

Jinshu Xuebao/Acta Metallurgica Sinica

Volumn 35, Issue 6, 1999, Pages 648-653

  Song, Guihong ^a,b   Sun, Chao ^a   Huang, Rongfang ^a   Wen, Lishi ^a  

^a INSTITUTE OF METAL RESEARCH   (China)

^b Shenyang Polytechnic University   (China)

Author keywords

Diamond film; Hot filament chemical vapor deposition (HFCVD); Nucleation; Simulation; Space field; Uniform growth

Indexed keywords

EID: 0042225660     PISSN: 04121961     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (10)

1. Kondoh E, Ohta Y, Mitomo T, Ohtsuka K. J Appl Phys, 1992; 72: 705
2. Matsui Y, Yabe H, Hirose Y. Diamond Related Mater, 1993; 2: 7
3. Gicquel A, Hassouni K, Farhat S, Breton Y, Scott C D, Lefebvre M, Pealat M. Diamond Related Mater, 1994; 3: 581
4. Dandy D S, Coltrin M E. J Mater Res, 1995; 10: 1993
5. Shen M R, Wang H, Ning Z Y, Ye C, Ren Z X. J Phys Condensed Mater, 1996; 8: 8953
6. Wolden C, Mitra C, Gleason K K. J Appl Phys, 1992; 72: 3750
7. Kong X Q. The Applications of the Finite Element in Heat Transfer. 3rd ed., Beijing: Science Press, 1998: 480
8. Zhang B Z. The Infinite Element Methods in Fluid Dynamics, Beijing: Mechanical Industry Press, 1986: 281
9. . Schaefer L, Sattler M, Klages C P. In: Tzeng Y, Yoshikawa M, Murakwa M. Feldman A eds., Proc 1st Int Conf on the Applications of Diamond Films and Related Materials, New York: Auburn, AL, 1991: 453
10. Yu J, Huang R F, Wen L S, Shi C X. Mater Lett, 1997; 32: 143