Metal film characterization with qualified spreading resistance

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 1, 2004, Pages 444-449

  Clarysse, T ^a   Hoflijk, I ^a   Zhang, W ^a,b   Maex, K ^a,b   Vandervorst, W ^a,b  

^a IMEC   (Belgium)

^b UNIVERSITY OF LEUVEN   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; ALUMINUM; ANNEALING; ATOMIC FORCE MICROSCOPY; COMPUTER SIMULATION; COPPER; ELECTRIC RESISTANCE; ELECTRONS; INTERFACES (MATERIALS); RUTHERFORD BACKSCATTERING SPECTROSCOPY; SEMICONDUCTING SILICON; SEMICONDUCTOR DOPING; THIN FILMS;

BARRIER FILMS; SPREADING RESISTANCE PROBE (SRP);

METALLIC FILMS;

EID: 1642273855     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1631291     Document Type: Conference Paper

References (12)

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