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Volumn 80, Issue 13, 2002, Pages 2407-2409

Impact of three-dimensional lateral current flow on ultrashallow spreading resistance profiles

Author keywords

[No Author keywords available]

Indexed keywords

CONDUCTIVE SURFACES; DEEP STRUCTURE; DEPTH PROFILE; DOPANT PROFILE; ELECTRICAL CHARACTERIZATION; LATERAL CURRENTS; MEASUREMENT TOOLS; SOFTWARE CORRECTION; SPREADING RESISTANCE; SPREADING RESISTANCE PROBES; SPREADING RESISTANCE PROFILE; SUB-100 NM;

EID: 79956040755     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1464224     Document Type: Article
Times cited : (5)

References (11)
  • 11
    • 79958191698 scopus 로고    scopus 로고
    • ISE Integrated Systems Engineering AG, DESSIS device simulator, Zurich, Switzerland
    • ISE Integrated Systems Engineering AG, DESSIS device simulator, Zurich, Switzerland.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.