Structural and in depth characterization of newly designed conducting/insulating TiN x O y /TiO 2 multilayers obtained by one step LP-MOCVD growth

Applied Surface Science

Volumn 175-176, Issue , 2001, Pages 685-690

  Fabreguette, F ^a   Imhoff, L ^a   Heintz, O ^a   Maglione, M ^a   Domenichini, B ^a   Marco De Lucas, M C ^a   Sibillot, P ^a   Bourgeois, S ^a   Sacilotti, M ^a  

^a LABORATOIRE INTERDISCIPLINAIRE CARNOT DE BOURGOGNE   (France)

Author keywords

In depth characterization; Multilayers; Thin film; TiN x O y; TiO 2

Indexed keywords

FILM GROWTH; METALLORGANIC CHEMICAL VAPOR DEPOSITION; SECONDARY ION MASS SPECTROMETRY; THIN FILMS; TITANIUM DIOXIDE; TITANIUM NITRIDE; TRANSMISSION ELECTRON MICROSCOPY;

IN DEPTH CHARACTERIZATION; TITANIUM ISOPROPOXIDE;

MULTILAYERS;

EID: 18244429867     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(01)00103-9     Document Type: Article

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