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Volumn 45, Issue 3-4, 2005, Pages 479-485

Low voltage SILC and P- and N-MOSFET gate oxide reliability

Author keywords

[No Author keywords available]

Indexed keywords

CHARGE CARRIERS; DEGRADATION; ELECTRIC CHARGE; ELECTRIC CURRENTS; ELECTRIC POTENTIAL; GATES (TRANSISTOR); HOLE MOBILITY; STRESS ANALYSIS;

EID: 15744373011     PISSN: 00262714     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.microrel.2004.08.002     Document Type: Article
Times cited : (13)

References (17)
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  • 2
    • 0000399466 scopus 로고    scopus 로고
    • Defect generation in field-effect transistors under channel-hot-electron stress
    • D.J. DiMaria Defect generation in field-effect transistors under channel-hot-electron stress J. Appl. Phys. 87 2000 8707 8715
    • (2000) J. Appl. Phys. , vol.87 , pp. 8707-8715
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  • 3
    • 0033352180 scopus 로고    scopus 로고
    • Low voltage tunneling in ultra-thin oxides: A monitor for interface states and degradation
    • A. Ghetti, E. Sangiorgi, J. Bude Sorsch, and G.T.W. Weber Low voltage tunneling in ultra-thin oxides: a monitor for interface states and degradation IEDM 1999
    • (1999) IEDM
    • Ghetti, A.1    Sangiorgi, E.2    Bude Sorsch, J.3    Weber, G.T.W.4
  • 6
  • 7
    • 0037772449 scopus 로고    scopus 로고
    • Efficiency of interface trap generation under hole injections in 2.1 nm thick gate-oxide P-MOSFETs
    • A. Bravaix, D. Goguenheim, N. Revil, L. Rubaldo, and E. Vincent Efficiency of interface trap generation under hole injections in 2.1 nm thick gate-oxide P-MOSFETs J. Non-Cryst. Solids 322 2003 139 146
    • (2003) J. Non-Cryst. Solids , vol.322 , pp. 139-146
    • Bravaix, A.1    Goguenheim, D.2    Revil, N.3    Rubaldo, L.4    Vincent, E.5
  • 9
    • 18744399538 scopus 로고    scopus 로고
    • Characterization of ultrathin metal-oxide-semiconductor structures using coupled current and capacitance-voltage models based on quantum calculation
    • O. Simonetti, T. Maurel, and M. Jourdain Characterization of ultrathin metal-oxide-semiconductor structures using coupled current and capacitance-voltage models based on quantum calculation J. Appl. Phys. 92 2002 4449 4458
    • (2002) J. Appl. Phys. , vol.92 , pp. 4449-4458
    • Simonetti, O.1    Maurel, T.2    Jourdain, M.3
  • 10
    • 0039189964 scopus 로고    scopus 로고
    • Anomalous low-voltage tunneling current characteristics of ultrathin gate oxide (∼2 nm) after high-field stress
    • C.H. Huang, and J.G. Hwu Anomalous low-voltage tunneling current characteristics of ultrathin gate oxide (∼2 nm) after high-field stress J. Appl. Phys. 89 2001 5497 5501
    • (2001) J. Appl. Phys. , vol.89 , pp. 5497-5501
    • Huang, C.H.1    Hwu, J.G.2
  • 11
    • 0035394885 scopus 로고    scopus 로고
    • High field stress at and above room temperature in 2.3 nm thick oxides
    • D. Zander, C. Petit, F. Saigne, and A. Meinertzhagen High field stress at and above room temperature in 2.3 nm thick oxides Microelect. Reliab. 41 2001 1023 1026
    • (2001) Microelect. Reliab. , vol.41 , pp. 1023-1026
    • Zander, D.1    Petit, C.2    Saigne, F.3    Meinertzhagen, A.4
  • 13
    • 0038529280 scopus 로고    scopus 로고
    • Physical and predictive models of ultrathin oxide reliability in CMOS devices and circuits
    • J.H. Stathis Physical and predictive models of ultrathin oxide reliability in CMOS devices and circuits IEEE Trans. Device and Materials Reliability 1 2001 43 59
    • (2001) IEEE Trans. Device and Materials Reliability , vol.1 , pp. 43-59
    • Stathis, J.H.1
  • 14
    • 0033730535 scopus 로고    scopus 로고
    • Reliability of ultrathin silicon dioxide under combined substrate hot-electron and constant voltage tunneling stress
    • E.M. Vogel, J.S. Suehle, M.D. Edelstein, B. Wang, Y. Chen, and J.B. Bernstein Reliability of ultrathin silicon dioxide under combined substrate hot-electron and constant voltage tunneling stress IEEE Trans. Electron Devices 47 2000 1183 1191
    • (2000) IEEE Trans. Electron Devices , vol.47 , pp. 1183-1191
    • Vogel, E.M.1    Suehle, J.S.2    Edelstein, M.D.3    Wang, B.4    Chen, Y.5    Bernstein, J.B.6
  • 15
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    • Degradation and breakdown in thin oxide layers: Mechanisms, models and reliability prediction
    • R. Degraeve, B. Kaczer, and G. Groeseneken Degradation and breakdown in thin oxide layers: mechanisms, models and reliability prediction Microelect. Reliab. 39 1999 1145 1160
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    • Degraeve, R.1    Kaczer, B.2    Groeseneken, G.3
  • 16
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    • (2001) IEEE Trans. Device Materials Reliability , vol.1 , pp. 163-169
    • Degraeve, R.1    Kaczer, B.2    De Keersgieter, A.3    Groeseneken, G.4
  • 17
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    • Ph.D. Thesis, L2MP, Toulon, France
    • C. Trapes, Ph.D. Thesis, 2003, L2MP, Toulon, France
    • (2003)
    • Trapes, C.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.