An analytical solution for thermal transport in deep x-ray lithography

Journal of Micromechanics and Microengineering

Volumn 15, Issue 3, 2005, Pages 474-484

  Yang, F ^a   Pitchumani, R ^a  

^a UNIVERSITY OF CONNECTICUT   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COOLING; EIGENVALUES AND EIGENFUNCTIONS; IRRADIATION; LITHOGRAPHY; MASKS; PHOTORESISTS; POLYMETHYL METHACRYLATES; SYNCHROTRON RADIATION; THERMAL CONDUCTIVITY; THERMAL STRESS; X RAYS;

BIOT NUMBER; DIMENSIONLESS INTENSITY; PARAMETRIC ANALYSIS; X-RAY LITHOGRAPHY;

HEAT TRANSFER;

EID: 15544382681     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/15/3/007     Document Type: Article

References (13)

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