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Volumn 351, Issue 1-2, 1999, Pages 66-72

Successful implementation methods of atmospheric CVD on a glass manufacturing line

Author keywords

Chemical vapor deposition; Deposition process; Glass coating; Organometallic vapor deposition

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COATED MATERIALS; COLOR; COST EFFECTIVENESS; FILM GROWTH; PROCESS CONTROL; PRODUCTIVITY; QUALITY CONTROL; THIN FILMS;

EID: 0033170254     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00199-6     Document Type: Article
Times cited : (41)

References (28)
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  • 2
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    • US Patent 4,419,386 Dec. 6
    • R.G. Gordon, US Patent 4,419,386 (Dec. 6, 1983).
    • (1983)
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  • 4
    • 33645245082 scopus 로고    scopus 로고
    • US Patent 5,750,265
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    • Goodman, R.D.1
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  • 11
    • 33645245288 scopus 로고    scopus 로고
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  • 15
    • 33645245989 scopus 로고
    • G.W. Cullen (Ed.), The Electrochemical Society, Pennington, NJ
    • K. Adachi, M. Mizuhashi, in: G.W. Cullen (Ed.), Proc. 10th Int. Conf. on CVD, The Electrochemical Society, Pennington, NJ, 1987.
    • (1987) Proc. 10th Int. Conf. on CVD
    • Adachi, K.1    Mizuhashi, M.2
  • 19
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.