Young's modulus of silicon nitride used in scanning force microscope cantilevers

Journal of Applied Physics

Volumn 95, Issue 4, 2004, Pages 1667-1672

  Khan, A ^a   Philip, J ^a   Hess, P ^a  

^a UNIVERSITY OF HEIDELBERG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; ELASTIC MODULI; EQUATIONS OF MOTION; FILM GROWTH; FOURIER TRANSFORMS; MECHANICAL VARIABLES MEASUREMENT; POISSON RATIO; SCANNING ELECTRON MICROSCOPY; THICKNESS MEASUREMENT;

LOW PRESSURE CHEMICAL VAPOR DEPOSITION; OSCILLATION FREQUENCIES; SCANNING FORCE MICROSCOPY; SURFACE ACOUSTIC WAVE METHOD;

SILICON NITRIDE;

EID: 1542306888     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1638886     Document Type: Article

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