Thin Film Transistors on Plastic Substrates Using Silicon Deposited by Microwave ECR-CVD

Materials Research Society Symposium - Proceedings

Volumn 769, Issue , 2003, Pages 41-46

  Teng, Lihong ^a   Anderson, Wayne A ^a  

^a State University of New York   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRON DIFFRACTION; ELLIPSOMETRY; LEAKAGE CURRENTS; MICROWAVES; PASSIVATION; PHOTOLITHOGRAPHY; POLYIMIDES; SILICON WAFERS; THIN FILMS; THRESHOLD VOLTAGE; TRANSMISSION ELECTRON MICROSCOPY;

RESIDUAL GAS ANALYZERS (RGA); SELECTIVE AREA ELECTRON DIFFRACTION (SAD);

THIN FILM TRANSISTORS;

EID: 1542304723     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-769-h2.4     Document Type: Conference Paper

References (10)

1. P. M. Smith, P. G. Carey and T. W. Sigmon, Appl. Phys. Lett., vol.70, pp.342-344, 1997.
2. A. Sazonov and A. Nathan, J. Vac. Sci. Technol., vol. A18, pp. 780-782, 2000.
3. R. B. Wehrspohn, S.C. Deane, I. D. French, I. Gale, J. Hewett, M. J. Powell and J. Robertson, J. Appl. Phys., vol. 87, pp. 144-154, 2000.
4. W. C. Choi, E. K. Kim, S. K. Min, C. Y. Park, J. H. Kim and T. Y. Seong, Appl. Phys. Lett., vol. 70, pp. 3014-3016, 1997.
5. M. Kitagawa, K. Setsune, Y. Manabe and T. Hirao, Jpn. J. Appl. Phys., vol.27, pp. 2026-2031, 1988.
6. J. R. Roth, "Industrial plasma engineering," vol. 1, pp. 501-510, 1995, Institute of Physics Publishing.
7. B. B. Jagannathan, R. L. Wallace and W. A. Anderson, J. Vac. Sci. Technol., vol. A16, pp. 2751-2756, 1998.
8. C-Y Chen and J. Kanicki, IEEE Electron Device Lett., vol. 17, pp. 437-439, 1996.
9. A. Madan, P. G. Le Comber and W. E. Spear, J. Non-Crystalline Solids, vol. 20, pp. 239-257, 1976.
10. C. G. Van de Walle and B. R. Tuttle, IEEE Trans. Electron Devices, vol. 47, pp. 1779-1786, 2000.