Modelling of residual stress in a multilayer micromachined cantilever

Proceedings of the International Semiconductor Conference, CAS

Volumn 2, Issue , 2000, Pages 499-502

  Poladian, V M ^a   Muller, R ^a   Mierlacioiu, N ^a  

^a NATIONAL INSTITUTE FOR RESEARCH AND DEVELOPMENT IN MICROTECHNOLOGIES   (Romania)

Author keywords

[No Author keywords available]

Indexed keywords

CANTILEVER BEAMS; COMPUTER SOFTWARE; MICROMACHINING; MODELS; OPTICAL WAVEGUIDES; SIMULATION; STRESS ANALYSIS; TENSILE STRESS;

SOFTWARE PACKAGE ANSYS;

RESIDUAL STRESSES;

EID: 0034446512     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)