Wafer Fusion of GaSb to GaAs

Materials Research Society Symposium - Proceedings

Volumn 768, Issue , 2003, Pages 101-106

  Wang, C A ^a   Liau, Z L ^a   Shiau, D A ^a   Nitishin, P M ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COVALENT BONDS; WAFER FUSION PROCESSES;

CHEMICAL BONDS; HETEROJUNCTIONS; INTERFACIAL ENERGY; MASS TRANSFER; METALLORGANIC VAPOR PHASE EPITAXY; MONOLITHIC INTEGRATED CIRCUITS; PHOTOLUMINESCENCE; PRESSURE EFFECTS; SCANNING ELECTRON MICROSCOPY; SURFACE STRUCTURE; THERMAL EFFECTS; VAPOR PRESSURE; X RAY DIFFRACTION ANALYSIS;

SEMICONDUCTING INDIUM GALLIUM ARSENIDE;

EID: 1542274448     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (14)

1. H.-R. Blank, M. Thomas, K.C. Wong, and H. Kroemer, Appl. Phys. Lett. 69, 2080 (1996).
2. K.G. Eyink, M.L. Seaford, T.W. Haas, D.H. Tomich, W.V. Lampert, S.D. Walck, J.S. Solomon, W.C. Mitchel, and L.F. Eastman, J. Vac. Sci. Technol. B 15, 1187 (1997).
3. K.D. Hobart and F.J. Kub, Electron. Lett. 35, 675 (1999).
4. Y. Zheng, P.D. Moran, Z.F. Guan, S.S. Lau, D.M. Hansen, T.F. Kuech, T.E. Haynes, T. Hoechbauer, and M. Natasi, J. Electron. Mater. 29, 916 (2000).
5. S.S. Yi, D.M. Hansen, C.K. Inoki, D.L. Harris, T.S. Kuan, and T.F. Kuech, Appl. Phys. Lett. 77, 842 (2000).
6. P.D. Moran, D. Chow, A. Hunter, and T.F. Kuech, Appl. Phys. Lett. 78, 2232 (2001).
7. M.N. Palmisiano, R.M. Biefeld, J.G. Cederberg, M.J. Hafich, G.M. Peake, AIP Conf. Proc. 653, 305-313 (2003).
8. C.A. Wang, P.G. Murphy, P.W. O'Brien, D.A. Shiau, A.C. Anderson, Z.L. Liau, D.M. DePoy, G. Nichols, AIP Conf. Proc. 653, 473-481 (2003).
9. Z.L. Liau and D.E. Mull, Appl. Phys. Lett. 56, 737 (1990).
10. Y.H. Lo, R. Bhat, D.M. Huang, M.A. Koza, and T.P. Lee, Appl. Phys. Lett. 58, 1961 (1991).
11. J.J. Dudley, D.I.. Babic, R. Mirin, L. Yang, B.I. Miller, R.J. Ram, T. Reynolds, E.L. Hu, and J.E. Bowers, Appl. Phys. Lett. 64, 1463 (1994).
12. F.A. Kish, F.M. Steranka, D.C. DeFevere, D.A. Vanderwater, K.G. Park, C.P. Kuo, T. D. Osentowski, M.J. Peanasky, J.G. Yu, R.M. Fletcher, D.A. Steigerwald, M.G. Craford, V.M. Robbins, Appl. Phys. Lett. 64, 2839 (1994).
13. Z.L. Liau, Appl. Phys. Lett. 77, 651 (2000).
14. C.A. Wang, H.K. Choi, G.W. Charache, IEE Proc.-Optoelectron. 147, 193-198 (2000).